Photoresist stripping of Si wafers

A process was developed on behalf of a technology company to remove a PMMA-based photoresist from Si wafers.

Project details
Contract research
Services -
Year:
2016
Funding:
Contact person:
Range of services
We work both on contract research and on our own developments. From laboratory and pilot scale to market maturity.
Our customers
Logo BASF
Logo Hugo Haeffner
Logo HEIQ
Logo Chancellor KVT
Logo Intelligent Fluids
Logo Oxford Biolabs
Logo CFM Oskar Tropitzsch
Logo Renosan
Logo Bavaria Pool

This might also interest you

This might also interest you

Together with partners from the cosmetics industry, a day cream with proven protection against harmful nitrogen oxides in the environment was developed.

Formulation of a day cream with NOx protection

On behalf of a cosmetics company, we adapted existing formulations of cosmetic colourants to the constantly changing restrictions of the European Cosmetics Regulation.

Efficient semi-permanent colouring of skin and hair

Production of high-quality raw materials for the fragrance and flavour industry from sustainable cultivation and from a single source

Cultivation and refinement of Iris germanica and I. pallida in Bavaria

Plant extraction on the basis of fatty acids to obtain fragrances

Green extraction of fragrant and aromatic plants